- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/2252 - Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
Patent holdings for IPC class G01N 23/2252
Total number of patents in this class: 136
10-year publication summary
0
|
4
|
8
|
13
|
23
|
17
|
23
|
23
|
18
|
5
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
JEOL Ltd. | 556 |
18 |
FEI Company | 851 |
11 |
HORIBA, Ltd. | 746 |
10 |
Applied Materials Israel, Ltd. | 549 |
7 |
Shimadzu Corporation | 5791 |
7 |
Oxford Instruments NanoTechnology Tools Limited | 145 |
6 |
Hitachi High-Tech Corporation | 4424 |
6 |
Bruker Nano GmbH | 63 |
5 |
International Business Machines Corporation | 60644 |
3 |
Pratt & Whitney Canada Corp. | 4215 |
3 |
Commissariat à l'énergie atomique et aux energies alternatives | 10525 |
3 |
JFE Steel Corporation | 6067 |
3 |
Delmic IP B.V. | 19 |
3 |
Proterial, Ltd. | 638 |
3 |
General Electric Company | 18133 |
2 |
Hitachi High-Technologies Corporation | 2034 |
2 |
Hitachi High-Tech Science Corporation | 326 |
2 |
Carl Zeiss Microscopy GmbH | 1146 |
2 |
National University Corporation Hamamatsu University School of Medicine | 122 |
2 |
Siltronic AG | 395 |
2 |
Other owners | 36 |